کود نیتروژن، عملکرد دانه را افزایش میدهد، امّا در شرایط تنش خشکی، حساسیت گیاه به خشکی را تشدید مینماید. این آزمایش برای ارزیابی محلولپاشی سیلیکون به همراه کود نیتروژن بر رشد و عملکرد دانه سیاهدانه (Nigella sativa L.) انجام گرفت. این تحقیق در دانشگاه رازی طی دو سال زراعی 1401-1399 بهصورت دو آزمایش جداگانه (در شرایط عدم تنش و در شرایط تنش خشکی) و هر آزمایش بهصورت اسپلیت پلات در قالب طرح پایه بلوکهای کامل تصادفی پیاده شد. عوامل آزمایشی شامل مقادیر نیتروژن بهعنوان عامل اصلی (صفر، 125 و 250 کیلوگرم اوره در هکتار) و محلولپاشی سیلیکون در چهار غلظت (صفر، سه، شش و نُه میلیمولار) بهعنوان عامل فرعی بودند. نتایج نشان داد که در شرایط تنش خشکی، اثر ساده نیتروژن و سیلیکون بر صفات مورد بررسی معنیدار بود. امّا در شرایط عدم تنش، سیلیکون بر صفات شاخص برداشت، وزن هزار دانه، روز تا گلدهی و طول دوره پر شدن دانه اثر معنیدار نداشت. اثر متقابل نیتروژن و سیلیکون در شرایط تنش بر اکثر صفات معنیدار شد. بالاترین عملکرد دانه در شرایط بدون تنش، از تیمار اثر متقابل 250 کیلوگرم اوره و محلولپاشی سیلیکون شش میلیمولار (8.6 درصد افزایش در مقایسه با شاهد) به دست آمد. درحالیکه در شرایط تنش خشکی، تیمار 250 کیلوگرم اوره و محلولپاشی سیلیکون نُه میلیمولار، از بالاترین عملکرد دانه (19.41 درصد افزایش در مقایسه با شاهد) برخوردار بود. در شرایط تنش، کود اوره 125 کیلوگرم در هکتار برای صفت تعداد دانه در کپسول مناسبتر بود، امّا با محلولپاشی سیلیکون، امکان افزایش مقدار کود اوره تا 250 کیلوگرم در هکتار وجود داشت. محلولپاشی سیلیکون با غلظت شش میلیمولار برای شرایط عدم تنش و نُه میلیمولار برای شرایط تنش خشکی به همراه مصرف 250 کیلوگرم در هکتار کود نیتروژن برای سیاهدانه قابل توصیه است.
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کشکولی,فرشته , قبادی,مختار و جلالی هنرمند,سعید . (1404). تأثیر محلولپاشی سیلیکون و کود نیتروژن در کاهش خسارت تنش خشکی بر رشد، عملکرد دانه و مراحل فنولوژی سیاهدانه (Nigella sativa L.). پژوهشهای زراعی ایران, 23(4), 375-397. doi: 10.22067/jcesc.2025.90916.1360
MLA
کشکولی,فرشته , , قبادی,مختار , و جلالی هنرمند,سعید . "تأثیر محلولپاشی سیلیکون و کود نیتروژن در کاهش خسارت تنش خشکی بر رشد، عملکرد دانه و مراحل فنولوژی سیاهدانه (Nigella sativa L.)", پژوهشهای زراعی ایران, 23, 4, 1404, 375-397. doi: 10.22067/jcesc.2025.90916.1360
HARVARD
کشکولی فرشته, قبادی مختار, جلالی هنرمند سعید. (1404). 'تأثیر محلولپاشی سیلیکون و کود نیتروژن در کاهش خسارت تنش خشکی بر رشد، عملکرد دانه و مراحل فنولوژی سیاهدانه (Nigella sativa L.)', پژوهشهای زراعی ایران, 23(4), pp. 375-397. doi: 10.22067/jcesc.2025.90916.1360
CHICAGO
فرشته کشکولی, مختار قبادی و سعید جلالی هنرمند, "تأثیر محلولپاشی سیلیکون و کود نیتروژن در کاهش خسارت تنش خشکی بر رشد، عملکرد دانه و مراحل فنولوژی سیاهدانه (Nigella sativa L.)," پژوهشهای زراعی ایران, 23 4 (1404): 375-397, doi: 10.22067/jcesc.2025.90916.1360
VANCOUVER
کشکولی فرشته, قبادی مختار, جلالی هنرمند سعید. تأثیر محلولپاشی سیلیکون و کود نیتروژن در کاهش خسارت تنش خشکی بر رشد، عملکرد دانه و مراحل فنولوژی سیاهدانه (Nigella sativa L.). پژوهشهای زراعی ایران. 1404;23(4):375-397. doi: 10.22067/jcesc.2025.90916.1360